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Showing results for ISSN matching 0948-1907

Transparent Conductive Thin Films of Sn Doped In2O3 Grown by Aerosol‐Assisted CVD Using InIII Acetylacetonate with 5 mol % SnIV Bis‐acetylacetonate Dibromide Dissolved in Acetylacetone

JOURNAL ARTICLE published October 2006 in Chemical Vapor Deposition

Authors: A. Suzuki | K. Maki

https://doi.org/10.1002/cvde.200506379 Actions

Observation of Structure‐Sensitive Decomposition of Cp(allyl)Pd on Pd Nanodots Formed by MOCVD

JOURNAL ARTICLE published March 2011 in Chemical Vapor Deposition

Authors: Axel Binder | Martin Seipenbusch | Gerhard Kasper

https://doi.org/10.1002/cvde.201006883 Actions

Masthead

JOURNAL ARTICLE published February 1997 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.19970030101 Actions

Recollections of CVD Conferences

JOURNAL ARTICLE published August 1997 in Chemical Vapor Deposition

Authors: John M. Blocher

https://doi.org/10.1002/cvde.19970030403 Actions

Author Index and Subject Index Chem. Vap. Deposition 1‐2/2008

JOURNAL ARTICLE published February 2008 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.200890002 Actions

Contents: (Chem. Vap. Deposition 1–2–3/2013)

JOURNAL ARTICLE published March 2013 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.201390000 Actions

Contents: Chem. Vap. Deposition 2‐3/2006

JOURNAL ARTICLE published March 2006 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.200690006 Actions

Contents: (Chem. Vap. Deposition 7–8/2008)

JOURNAL ARTICLE published July 2008 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.200890011 Actions

Atomic Vapor Deposition of Titanium Nitride as Metal Electrodes for Gate‐last CMOS and MIM Devices

JOURNAL ARTICLE published June 2008 in Chemical Vapor Deposition

Authors: Mindaugas Lukosius | Christian Wenger | Sergej Pasko | Hans‐Joachim Müssig | Bernhard Seitzinger | Christoph Lohe

https://doi.org/10.1002/cvde.200806695 Actions

Special Issue on Nanodiamonds

JOURNAL ARTICLE published July 2008 in Chemical Vapor Deposition

Authors: Amanda S. Barnard | Oliver A. Williams

https://doi.org/10.1002/cvde.200800001 Actions

Cover picture from Haycock and co‐workers (Chem. Vap. Deposition 7–8/2008)

JOURNAL ARTICLE published July 2008 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.200890010 Actions

Functional Nanoimprinting

JOURNAL ARTICLE published September 2012 in Chemical Vapor Deposition

Authors: Hayley G. Andrews | Thomas J. Wood | Wayne C. E. Schofield | Jas Pal S. Badyal

https://doi.org/10.1002/cvde.201106970 Actions

Contents: (Chem. Vap. Deposition 7–8–9/2012)

JOURNAL ARTICLE published September 2012 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.201290006 Actions

JOURNAL ISSUE published September 2005 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.v11:8/9 Actions

Author Index and Subject Index Chem. Vap. Deposition 9/2007

JOURNAL ARTICLE published September 2007 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.200790026 Actions

ZrO2/SiO2 Fine Particle Synthesis by MOCVD

JOURNAL ARTICLE published September 2007 in Chemical Vapor Deposition

Authors: P. Moravec | J. Smolík | H. Keskinen | J. M. Mäkelä | V. V. Levdansky

https://doi.org/10.1002/cvde.200606561 Actions

Growth by Liquid‐Injection MOCVD and Properties of HfO2 Films for Microelectronic Applications

JOURNAL ARTICLE published March 2006 in Chemical Vapor Deposition

Authors: C. Dubourdieu | E. Rauwel | C. Millon | P. Chaudouët | F. Ducroquet | N. Rochat | S. Rushworth | V. Cosnier

https://doi.org/10.1002/cvde.200506397 Actions

Contents: Chem. Vap. Deposition 4/2002

JOURNAL ARTICLE published 4 July 2002 in Chemical Vapor Deposition

https://doi.org/10.1002/1521-3862(20020704)8:4<123::aid-cvde123>3.0.co;2-a Actions

YBa2Cu3O7-x Thin Films and YBa2Cu3O7-x/CeO2 Heteroepitaxial Structures Grown on YSZ Substrates by Pulsed Injection CVD

JOURNAL ARTICLE published August 1999 in Chemical Vapor Deposition

Authors: Adulfas Abrutis | Valentina Plaušinaitienė | Arūnas Teišerskis | Virgaudas Kubilius | Jean-Pierre Senateur | François Weiss

https://doi.org/10.1002/(sici)1521-3862(199908)5:4<171::aid-cvde171>3.0.co;2-1 Actions

Atomic Layer Deposition of Tantalum Oxide and Tantalum Silicate from Chloride Precursors

JOURNAL ARTICLE published September 2012 in Chemical Vapor Deposition

Authors: Christoph Adelmann | Annelies Delabie | Bart Schepers | Leonard N. J. Rodriguez | Alexis Franquet | Thierry Conard | Karl Opsomer | Inge Vaesen | Alain Moussa | Geoffrey Pourtois | Kristine Pierloot | Matty Caymax | Sven Van Elshocht

https://doi.org/10.1002/cvde.201106967 Actions
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