In-Situ Mass Spectrometry Analyses of the Fragmentation of Linear and Cyclic Siloxanes in a Glow Discharge Compared with Ex-Situ FTIR Analyses of the Deposits

JOURNAL ARTICLE published 4 July 2002 in Chemical Vapor Deposition

Authors: V. Rouessac | S. Roualdes | J. Durand

Suppression of Thermal Convection and Its Effect on Growth of GaN in Metal Organic Vapor Phase Epitaxy

JOURNAL ARTICLE published October 1998 in Chemical Vapor Deposition

Authors: Gang Li | Soo J. Chua | Wen Wang

Bis(8-hydroxy-5-quinolyl)-methane Aluminum Chelate Polymer Film Prepared by CVD

JOURNAL ARTICLE published March 2001 in Chemical Vapor Deposition

Authors: J. Yu | Z. Chen | S. Miyata

LP-CVD Silicon-Based Film Formation in Submicrometer Trenches in Industrial Equipment: Experiments and Simulation

JOURNAL ARTICLE published 3 September 2002 in Chemical Vapor Deposition

Authors: H. Gris | B. Caussat | D. Cot | J. Durand | J.-P. Couderc

Random Deposition as a Growth Mode in Atomic Layer Deposition (Chem. Vap. Deposition 2004, 3, 159)

JOURNAL ARTICLE published May 2005 in Chemical Vapor Deposition

Authors: R.L. Puurunen

Atomic Layer Deposition‐Modified Ordered Mesoporous Silica Membranes

JOURNAL ARTICLE published March 2012 in Chemical Vapor Deposition

Authors: David E. Cassidy | William J. DeSisto

Chem. Vap. Deposition (10–11–12/2014)

JOURNAL ARTICLE published December 2014 in Chemical Vapor Deposition

Chem. Vap. Deposition (1–2–3/2014)

JOURNAL ARTICLE published March 2014 in Chemical Vapor Deposition

Cover image from A. M. Zhu and co‐workers (Chem. Vap. Deposition 2014, 20, 8)

JOURNAL ARTICLE published March 2014 in Chemical Vapor Deposition

Synthesis of Nitrogen‐doped Carbon Nanocoils via One‐step Acetonitrile Catalytic CVD using a Ni‐Fe Layered Double Hydroxide as Catalyst Precursor

JOURNAL ARTICLE published December 2013 in Chemical Vapor Deposition

Authors: Tomohiro Iwasaki | Masashi Tomisawa | Hideya Nakamura | Satoru Watano

JOURNAL ISSUE published March 2014 in Chemical Vapor Deposition

Chem. Vap. Deposition (1–2–3/2014)

JOURNAL ARTICLE published March 2014 in Chemical Vapor Deposition

tert‐Butylethynyl‐parylene and Phenylethynyl‐parylene

JOURNAL ARTICLE published March 2014 in Chemical Vapor Deposition

Authors: Jay J. Senkevich

Substrate‐thickness Dependence of Hydrogenated Microcrystalline Silicon Nucleation Rate on Amorphous Silicon Layer

JOURNAL ARTICLE published December 2013 in Chemical Vapor Deposition

Authors: Zewen Zuo | Guanglei Cui | Yu Wang | Junzhuan Wang | Lin Pu | Yi Shi

Growth of a Carbon Nanotube Forest on Silicon using Remote Plasma CVD

JOURNAL ARTICLE published December 2013 in Chemical Vapor Deposition

Authors: Rinat R. Ismagilov | Petr V. Shvets | Aleksey A. Zolotukhin | Alexander N. Obraztsov

ITO‐induced Columnar Polycrystalline Silicon Thin Films by CVD

JOURNAL ARTICLE published June 2015 in Chemical Vapor Deposition

Authors: Jun Du | Xin Gu | Huaqiang Fu | Haizhi Guo | Jiao Liu | Qi Wu | Jianguo Zou

Chem. Vap. Deposition (7–8–9/2013)

JOURNAL ARTICLE published September 2013 in Chemical Vapor Deposition

Growth of a Carbon Micro‐ and Nanocoils Mixture using NiSO₄ as the Catalyst Precursor

JOURNAL ARTICLE published March 2015 in Chemical Vapor Deposition

Authors: Ruixue Cui | Dawei Li | Xin Fu | Muhammad Asif | Lujun Pan

Cover image from I. P. Parkin and co‐workers (Chem Vap. Deposition 2013, 19, 355)

JOURNAL ARTICLE published December 2013 in Chemical Vapor Deposition

Chem. Vap. Deposition (1–2–3/2015)

JOURNAL ARTICLE published March 2015 in Chemical Vapor Deposition