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Showing results for ISSN matching 0948-1907

Structural Properties of Yttria‐Stabilized Zirconia Films Grown on Silicon (001) Using MOCVD

JOURNAL ARTICLE published March 1997 in Chemical Vapor Deposition

Authors: Gemma Garcia | Juan Casado | Joan Llibre | Joan Cifre | Albert Figueras | Salvador Galí | Josep Bassas

https://doi.org/10.1002/cvde.19970030207 Actions

Plasma-Enhanced CVD of Fluorocarbon Thin Films via CF3H/H2 Chemistries

JOURNAL ARTICLE published February 2000 in Chemical Vapor Deposition

Authors: J. J. Senkevich | M. J. Tutor | D. W. Sherrer II

https://doi.org/10.1002/(sici)1521-3862(200002)6:1<13::aid-cvde13>3.0.co;2-2 Actions

Self‐organized microstructure growth

JOURNAL ARTICLE published November 1995 in Chemical Vapor Deposition

Authors: Richard Nötzel | Takashi Fukui | Hideki Hasegawa | Jiro Temmyo | Atsuo Kozen | Toshiaki Tamamura

https://doi.org/10.1002/cvde.19950010305 Actions

JOURNAL ISSUE published April 2000 in Chemical Vapor Deposition

https://doi.org/10.1002/(sici)1521-3862(200004)6:2<>1.0.co;2-x Actions

CVD Activities in Greece

JOURNAL ARTICLE published June 1999 in Chemical Vapor Deposition

Authors: Dimitris Davazoglou

https://doi.org/10.1002/(sici)1521-3862(199906)5:3<99::aid-cvde99>3.0.co;2-e Actions

Cyclic Atomic Layer Deposition of Hafnium Aluminate Thin Films Using Tetrakis(diethylamido)hafnium, Trimethyl Aluminum, and Water

JOURNAL ARTICLE published March 2006 in Chemical Vapor Deposition

Authors: S.‐H. Kim | S.‐W. Rhee

https://doi.org/10.1002/cvde.200506371 Actions

Silicon Oxycarbide Thin Films by Remote Microwave Hydrogen Plasma CVD Using a Tetramethyldisiloxane Precursor

JOURNAL ARTICLE published June 2015 in Chemical Vapor Deposition

Authors: Aleksander M. Wrobel | Pawel Uznanski | Agnieszka Walkiewicz‐Pietrzykowska | Bartosz Glebocki | Ewa Bryszewska

https://doi.org/10.1002/cvde.201504330 Actions

Deposition of HfO2 Films by Liquid Injection MOCVD Using a New Monomeric Alkoxide Precursor, [Hf(dmop)4]

JOURNAL ARTICLE published July 2005 in Chemical Vapor Deposition

Authors: Y. F. Loo | R. O'Kane | A. C. Jones | H. C. Aspinall | R. J. Potter | P. R. Chalker | J. F. Bickley | S. Taylor | L. M. Smith

https://doi.org/10.1002/cvde.200506384 Actions

A Delivery System for Precursor Vapors Based on Sublimation in a Fluidized Bed

JOURNAL ARTICLE published March 2007 in Chemical Vapor Deposition

Authors: C. Vahlas | B. Caussat | F. Senocq | W. L. Gladfelter | L. Aloui | T. Moersch

https://doi.org/10.1002/cvde.200606513 Actions

Cyclopentadienyl Precursors for the Atomic Layer Deposition of Erbium Oxide Thin Films

JOURNAL ARTICLE published September 2014 in Chemical Vapor Deposition

Authors: Timothee Blanquart | Mikko Kaipio | Jaakko Niinistö | Marco Gavagnin | Valentino Longo | Laurie Blanquart | Clement Lansalot | W. Noh | Heinz D. Wanzenböck | Mikko Ritala | Markku Leskelä

https://doi.org/10.1002/cvde.201407116 Actions

Magnesium Oxide Thin Films with Tunable Crystallographic Preferred Orientation via Aerosol‐Assisted CVD

JOURNAL ARTICLE published June 2015 in Chemical Vapor Deposition

Authors: Sapna D. Ponja | Ivan P. Parkin | Claire J. Carmalt

https://doi.org/10.1002/cvde.201507156 Actions

Growth and Properties of Amorphous Erbium‐doped Aluminum‐yttrium Oxide Films Deposited by Aerosol‐UV‐Assisted MOCVD

JOURNAL ARTICLE published March 2015 in Chemical Vapor Deposition

Authors: Rached Salhi | Carmen Jimenez | Jean‐Luc Deschanvres | Ramzi Maâlej | Mohieddine Fourati

https://doi.org/10.1002/cvde.201407068 Actions

Deposition of Thin Copper Layers using Copper(II) Carboxylate Complexes with tert‐Butylamine as New CVD Precursors

JOURNAL ARTICLE published September 2013 in Chemical Vapor Deposition

Authors: Piotr Piszczek | Iwona Barbara Szymańska | Ewa Talik | Janusz Heimann

https://doi.org/10.1002/cvde.201207049 Actions

Cover image from Jones and co‐workers (Chem. Vap. Deposition 2010, 16, 257)

JOURNAL ARTICLE published December 2014 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.201471011 Actions

Multifunctional Nanocomposite Thin Films by Aerosol‐Assisted CVD

JOURNAL ARTICLE published September 2010 in Chemical Vapor Deposition

Authors: Michael E.A. Warwick | Charles W. Dunnill | Russell Binions

https://doi.org/10.1002/cvde.201006841 Actions

Highly Photocatalytically Active Iron(III) Titanium Oxide Thin films via Aerosol‐Assisted CVD

JOURNAL ARTICLE published March 2015 in Chemical Vapor Deposition

Authors: Sanjayan Sathasivam | Davinder S. Bhachu | Yao Lu | Salem M. Bawaked | Abdullah Y. Obaid | Shaeel Al‐Thabaiti | Sulaiman N. Basahel | Claire J. Carmalt | Ivan P. Parkin

https://doi.org/10.1002/cvde.201407143 Actions

Full CVD Reel‐To‐Reel Process to Obtain Perfectly Oriented Silicon Films on Metal Tapes with Oxide Buffer Layers**

JOURNAL ARTICLE published December 2014 in Chemical Vapor Deposition

Authors: Mikhail Moyzykh | Sergey Samoilenkov | Vadim Amelichev | Alexander Vasiliev | Mikhail Pozdnyakov | Alexey Mankevich | Vsevolod Tschepikov | Andrey Kaul

https://doi.org/10.1002/cvde.201407107 Actions

Farewell and Welcome

JOURNAL ARTICLE published December 2015 in Chemical Vapor Deposition

Authors: Michael L. Hitchman

https://doi.org/10.1002/cvde.201502015 Actions

Chem. Vap. Deposition (10–11–12/2015)

JOURNAL ARTICLE published December 2015 in Chemical Vapor Deposition

https://doi.org/10.1002/cvde.201571013 Actions

Preparation of Highly Flexible SiC Nanowires by Fluidized Bed Chemical Vapor Deposition

JOURNAL ARTICLE published September 2015 in Chemical Vapor Deposition

Authors: Rongzheng Liu | Malin Liu | Jiaxing Chang | Youlin Shao | Bing Liu

https://doi.org/10.1002/cvde.201507171 Actions
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